If you want to deposit silicon nitride on a semiconductor substrate, there are two methods available: 1. the use of low-pressure chemical vapor deposition at relatively high temperatures using the vertical or horizontal tube furnace. Silicon nitride. 2. plasma-enhanced chemical vapor deposition at a relatively low temperature vacuum conditions. Production of silicon nitride. Production process of silicon nitride products: silicon nitride reaction product according to the process can be divided into sintered products, hot products, atmospheric sintering products, isostatic pressing and sintering products and reaction Reheating products. Wherein the reaction sintering is a commonly used method for the production of silicon refractory products.